Single Wafer Cleaner

Single Wafer Cleaner
Single Wafter Cleaner C

Single Wafter Cleaner B

Single Wafter Cleaner A

System Concept

  1. System Flexibility
  2. Multi Chemistry
  3. Warm IPA Dryer
  4. Backside Process
  5. Mechanical Advantage
  • This equipment performs a process of removing impurities and metals on the surface of the wafer using chemicals.
  • Chemical：BOE、DHF、IPA、SC-1、SPM、ETC